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Use Sze for the fundamentals, then look at IEEE papers for the latest on High-K Metal Gates (HKMG).

is the process of creating an integrated circuit (IC) by combining millions—and now billions—of MOS transistors onto a single chip. Before VLSI, chips had limited functionality; today, VLSI is what allows a supercomputer to fit inside your pocket.

S.M. Sze’s contributions, particularly his documentation of device physics and fabrication techniques, provided the first unified framework for understanding how these microscopic cities are built. Key Pillars of Semiconductor Fabrication

VLSI Technology: Navigating the Legacy of S.M. Sze in the Modern Era

To change the electrical properties of silicon, "impurities" or dopants must be added. Sze’s research into how these atoms move through the silicon lattice (diffusion) and how they are physically blasted into the surface (ion implantation) is foundational for creating P-N junctions. 4. Thin Film Deposition

You might wonder: Is a classic text still useful in the age of FinFETs and GAA (Gate-All-Around) transistors?

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